Advanced Micro-Fabrication Equipment Inc. China

SHA-688012
Shanghai Stock Exchange
Technology Semiconductor Equipment & Materials
Global Rank
#900
Country Rank
#99
Market Cap
25.37 B
Price
40.65
Change (%)
0.69%
Volume
22.31 M

Advanced Micro-Fabrication Equipment Inc. China's latest marketcap:

25.37 B

As of 09/27/2025, Advanced Micro-Fabrication Equipment Inc. China's market capitalization has reached $25.37 B. According to our data, Advanced Micro-Fabrication Equipment Inc. China is the 900th most valuable company globally by market capitalization. Market capitalization, commonly referred to as market cap, represents the total market value of all outstanding shares of a publicly traded company and is often used as a measure of company value.

Market Cap 25.37 B
Revenue (ttm) 1.48 B
Net Income (ttm) 252.97 M
Shares Out 624.05 M
EPS (ttm) 0.4
Forward PE 61.78
Ex-Dividend Date 07/10/2025
Earnings Date 08/29/2025
Market Cap Chart
Data Updated: 09/27/2025

Advanced Micro-Fabrication Equipment Inc. China's yearly market capitalization.

Advanced Micro-Fabrication Equipment Inc. China has seen its market value grow from ¥49.42 B to ¥180.97 B since 2019, representing a total increase of 266.19% and an annual compound growth rate (CAGR) of 25.36%.
Date Market Cap(¥) Market Cap(USD) Change (%) Global Rank
09/27/2025 ¥180.97 B $25.37 B 52.66% 900
12/31/2024 ¥117.73 B $16.12 B 23.76% 1139
12/29/2023 ¥95.12 B $13.4 B 57.49% 1264
12/30/2022 ¥60.4 B $8.75 B -22.58% 1682
12/31/2021 ¥78.02 B $12.28 B -7.44% 1535
12/31/2020 ¥84.29 B $12.91 B 70.55% 1291
12/31/2019 ¥49.42 B $7.1 B 1796

Company Profile

About Advanced Micro-Fabrication Equipment Inc. China

Advanced Micro-Fabrication Equipment Inc. China specializes in the research, development, manufacturing, and sale of high-end semiconductor and pan-semiconductor equipment. The company is a key player in China's semiconductor industry, providing cutting-edge solutions for advanced fabrication processes.

Key Products and Offerings

  • Capacitive Plasma Etching Equipment: Designed for etching dielectric materials such as silicon oxide and nitride.
  • Inductive Plasma Etching Equipment: Used for processing single crystal silicon and polycrystalline silicon materials.
  • Deep Silicon Etching Equipment: Ideal for applications involving single crystal silicon and polycrystalline silicon.
  • MOCVD Equipment: Supports advanced semiconductor manufacturing processes.
  • LPCVD Equipment: Used for NAND contact holes and metal tungsten wires.
  • VOC Equipment: Enhances fabrication efficiency and precision.

Company Background

Founded in 2004, Advanced Micro-Fabrication Equipment Inc. China is headquartered in Shanghai, the People’s Republic of China. The company has established itself as a leader in semiconductor equipment innovation, catering to the growing demands of the global semiconductor industry.

Frequently Asked Questions

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